|
3D Surface Microscopy Flexible techniques for surface analysis
Windsor Scientific offers a unique range of instruments for 3D surface analysis, each working with a unique set of techniques to allow the user to not only image their surface but to measure quantitative parameters such as roughness, form and feature dimensions. Each technique has it`s own set of advantages for the measurement of different surface types and so to help users to pick which system might be best suited to their application the following tables summarise the general technical specifications between the techniques and give a brief summary of the strengths and key application areas for each system:
| Instrument type |
Nanosurf AFMs |
Lyncee Tec Digital Holographic Microscope (DHM-R) |
Sensofar PLu |
| Imaging technique |
Atomic Force Microscopy |
High Resolution AFM |
Single Wavelength DHM |
Dual Wavelength DHM |
Phase Shifting Interferometry (PSI) |
Vertical Scanning Interferometry (VSI) |
Confocal Profilometry |
| Lateral resolution |
<2nm |
<1nm |
330nm* |
330nm* |
240nm* |
240nm* |
140nm* |
| Vertical Resolution |
<0.3nm |
<0.05nm |
<0.1nm
(all obj) |
<50nm
<0.1nm (mapping) |
<0.1nm
(all obj) |
<1nm (all obj) |
<0.1nm* |
| Field of View (max) |
110 x 110um |
10 x 10um |
4.4 x 3mm |
4.4 x 3mm |
5 x 3.8mm |
5 x 3.8mm |
2.5 x 1.5mm |
| Typical speed of measurement |
Minutes |
Minutes |
100us |
100us |
3s |
10s |
5s |
| Max roughness Sa (sample dependent) |
~5um |
100`s of nm |
~300nm |
~1um |
~100nm |
~5um |
~10s of um |
| Vertical Range |
~22um |
~2um |
500um |
500um |
5um |
10mm |
10mm |
| Max step height |
~15um |
~1.8um |
330nm |
15um |
150nm |
10mm |
10mm |
| Angle tolerance |
Up to 80°
(probe / sample dependent) |
Up to 80°
(probe / sample dependent) |
Up to 40°* |
Up to 40°* |
Up to 40°* |
Up to 40°* |
Up to 71°* |
*indicates value is objective dependent
|
Sensofar PLu neox: Combined Confocal/Interferometry
- rough samples
- low reflectivity
- steep slopes (70 degrees for smooth slopes, higher for rougher slopes)
Key Application Areas: Coatings, Solar Cells, Paper
Further information
|
 |
|
Lyncee Tec DHM R1000: Digital Holographic Microscopy
- Realtime measurements (single aquisition)
- sub-nm vertical resolution with large field of view
- vibration insensitive
Key Application Areas: MEMs, MOEMs, Full wafer characterisation, Micro-optics.
Further information
|
 |
|
Nanosurf Nanite/easyScan 2: Atomic Force Microscopy
- Superior lateral resolution (<2nm)
- Measurements of non-reflective and heterogenous surfaces
- Ability to obtain information about surface conductivity, chemistry, mechanics etc
Key Application Areas: Nanostructures, Nanoparticles, Polymers.
Further information
|
 |
|
|
